Description
Worldwide nearly 3,000 SemiChem APM systems are installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:
· Copper, tungsten, barrier, and metal CMP
· Formulated cleans
· DSP+
· Wet etch, nitride etch
· PAN etch, Piranha etch
· HF
· Wastewater
A wet chemical monitoring system that automatically samples, analyzes, and reports quantitative chemical concentration of critical processes, helping to increase product yields.
· Provides the industry’s most precise monitoring available to maintain process chemical composition and integrity
· Detects process excursions in volatile chemistries before loss of product quality
· Transitioning the lab technology to the process allows fast and accurate process control
· Maintains a mean time between failures (MTBF) >8500 hours
· Provides class-leading chemical concentration data allowing the slurry/chemical distribution system to deliver exact chemical concentration
