<\/p>\n
Worldwide nearly 3,000 SemiChem APM systems are installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:<\/span><\/p>\n \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Copper, tungsten, barrier, and metal CMP<\/span> A wet chemical monitoring system that automatically samples, analyzes, and reports quantitative chemical concentration of critical processes, helping to increase product yields.<\/span><\/p>\n \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Provides the industry’s most precise monitoring available to maintain process chemical composition and integrity<\/span> Worldwide nearly 3,000 SemiChem APM systems are installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including: \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 Copper, tungsten, barrier, and metal CMP \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 Formulated cleans \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 DSP+ \u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 Wet etch,<\/p>\n
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Formulated cleans<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>DSP+<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Wet etch, nitride etch<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>PAN etch, Piranha etch<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>HF<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Wastewater<\/span><\/p>\n
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Detects process excursions in volatile chemistries before loss of product quality<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Transitioning the lab technology to the process allows fast and accurate process control<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Maintains a mean time between failures (MTBF) >8500 hours<\/span>
\n\u00b7\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 <\/span><\/span><\/span>Provides class-leading chemical concentration data allowing the slurry\/chemical distribution system to deliver exact chemical concentration<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"